Asala  H. Ali, Ibtisam J.  Abd Ali Al-Fatlawi, Ali Hassan  Ressen, Adel H.  Omran Alkhayatt, 
    Influence of Solution pH and NH<sub>3</sub> Concentration on Some Properties of CuO
Thin Films Deposited by Chemical Solution Method,
    Journal of Engineering and Applied Sciences,
    Volume 13,Issue 23,
    2018,
    Pages 9961-9967,
    ISSN 1816-949x,
    jeasci.2018.9961.9967,
    (https://makhillpublications.co/view-article.php?doi=jeasci.2018.9961.9967)
    Abstract: Copper oxide (CuO) thin films were deposited onto glass substrates using Successive Ionic Layer Adsorption and Reaction (SILAR) method. Structural, surface morphology and optical properties of the synthesized films were studied as a function of ammonia&rsquo;s solution concentration and pH. X-ray diffractometer, AFM, UV-V is spectroscopy were used to investigate the structure, morphology and optical properties of the films. All the films had exhibited amorphous structure for the films with NH<sub>3</sub> concentration 30% and pH 10 which would reflect the low crystallinity and polycrystalline monoclinic structure. Morphological studies, generally, revealed that the uniformity of the film surface and the average roughness and RMS decrease with increasing the ammonia concentration and pH solution. Optical parameters such as band gap energy decreases 2.03-1.92 and 2.57-2.28 eV with increasing the concentration of ammonia and pH values, respectively. It was found that the optimum deposition condition of CuO nanostructure films was with solution pH of about 10 and NH<sub>3</sub> concentration of 30%.
    Keywords: CuO thin film;SILAR;structure and surface morphology;optical band gap;optical properties;roughness