TY  - JOUR
T1  - Influence of Solution pH and NH<sub>3</sub> Concentration on Some Properties of CuO
Thin Films Deposited by Chemical Solution Method
AU - H. Ali, Asala AU - Abd Ali Al-Fatlawi, Ibtisam J. AU - Ressen, Ali Hassan AU - Omran Alkhayatt, Adel H. 
JO  - Journal of Engineering and Applied Sciences
VL  - 13
IS  - 23
SP  - 9961
EP  - 9967
PY  - 2018
DA  - 2001/08/19
SN  - 1816-949x
DO  - jeasci.2018.9961.9967
UR  - https://makhillpublications.co/view-article.php?doi=jeasci.2018.9961.9967
KW  - CuO thin film
KW  -SILAR
KW  -structure and surface morphology
KW  -optical band gap
KW  -optical properties
KW  -roughness
AB  - Copper oxide (CuO) thin films were deposited onto glass substrates using Successive Ionic Layer Adsorption and Reaction (SILAR) method. Structural, surface morphology and optical properties of the synthesized films were studied as a function of ammonia&rsquo;s solution concentration and pH. X-ray diffractometer, AFM, UV-V is spectroscopy were used to investigate the structure, morphology and optical properties of the films. All the films had exhibited amorphous structure for the films with NH<sub>3</sub> concentration 30% and pH 10 which would reflect the low crystallinity and polycrystalline monoclinic structure. Morphological studies, generally, revealed that the uniformity of the film surface and the average roughness and RMS decrease with increasing the ammonia concentration and pH solution. Optical parameters such as band gap energy decreases 2.03-1.92 and 2.57-2.28 eV with increasing the concentration of ammonia and pH values, respectively. It was found that the optimum deposition condition of CuO nanostructure films was with solution pH of about 10 and NH<sub>3</sub> concentration of 30%.
ER  -