Journal of Engineering and Applied Sciences
ISSN: Online 1818-7803ISSN: Print 1816-949x
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Influence of Solution pH and NH3 Concentration on Some Properties of CuO Thin Films Deposited by Chemical Solution Method
Asala H. Ali, Ibtisam J. Abd Ali Al-Fatlawi, Ali Hassan Ressen and Adel H. Omran Alkhayatt
Page: 9961-9967 | Received 21 Sep 2022, Published online: 21 Sep 2022
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Abstract
Copper oxide (CuO) thin films were deposited onto glass substrates using Successive Ionic Layer Adsorption and Reaction (SILAR) method. Structural, surface morphology and optical properties of the synthesized films were studied as a function of ammonia’s solution concentration and pH. X-ray diffractometer, AFM, UV-V is spectroscopy were used to investigate the structure, morphology and optical properties of the films. All the films had exhibited amorphous structure for the films with NH3 concentration 30% and pH 10 which would reflect the low crystallinity and polycrystalline monoclinic structure. Morphological studies, generally, revealed that the uniformity of the film surface and the average roughness and RMS decrease with increasing the ammonia concentration and pH solution. Optical parameters such as band gap energy decreases 2.03-1.92 and 2.57-2.28 eV with increasing the concentration of ammonia and pH values, respectively. It was found that the optimum deposition condition of CuO nanostructure films was with solution pH of about 10 and NH3 concentration of 30%.
How to cite this article:
Asala H. Ali, Ibtisam J. Abd Ali Al-Fatlawi, Ali Hassan Ressen and Adel H. Omran Alkhayatt. Influence of Solution pH and NH3 Concentration on Some Properties of CuO
Thin Films Deposited by Chemical Solution Method.
DOI: https://doi.org/10.36478/jeasci.2018.9961.9967
URL: https://www.makhillpublications.co/view-article/1816-949x/jeasci.2018.9961.9967